Anomalous lateral Zn surface diffusion in InP caused by Zn-contained metallization
1997
We report an anomalous Zn surface diffusion in InP during annealing of ohmic contact structures containing Zn. A Pd/Zn/Pd contact was used to demonstrate this phenomenon. Electrical properties of the contact were monitored to corroborate this anomalous surface diffusion. Cross-sectional scanning electron microscopy was also used to delineate the Zn diffusion front lines. It was found that the Zn surface lateral diffusion can extend ≥50 µm for samples annealed at 500°C or higher temperatures. Close attention should be paid to this anomalous lateral surface diffusion during fabrication of devices using Zn-contained ohmic contacts.
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