Controlling template erosion with advanced cleaning methods
2012
We studied the erosion and feature stability of fused silica patterns under different template cleaning conditions. The
conventional SPM cleaning is compared with an advanced non-acid process. Spectroscopic ellipsometry optical
critical dimension (SE-OCD) measurements were used to characterize the changes in pattern profile with good
sensitivity. This study confirmed the erosion of the silica patterns in the traditional acid-based SPM cleaning mixture
(H2SO4+H2O2) at a rate of ~0.1nm per cleaning cycle. The advanced non-acid clean process however only showed
CD shift of ~0.01nm per clean. Contamination removal & pattern integrity of sensitive 20nm features under
MegaSonic assisted cleaning is also demonstrated.
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