A projection optical system, exposure apparatus, exposure method, a method of manufacturing a display, the manufacturing method of the mask and the mask

The exposure apparatus of the present invention, an exposure apparatus for performing projection exposure on the second on an object while moving along a first object M and a second object P in the scanning direction, on a part of a region on the second object first projection optical system PL10, the first object to a second area different from said part of the region on the second object to form an enlarged image of a portion on the first object in the first region is and a second projection optical system PL11 for forming an enlarged image of a different portion from said portion of the upper, and holds the first object, at least one of said portion and the different portion of the first object the a first stage MST which is movable along the non-scanning direction, wherein the first region and the second region being arranged at predetermined intervals along the non-scanning direction crossing the scanning direction that.