High-temperature synthetic gas graded chilling device and method

The invention provides a high-temperature synthetic gas graded chilling device which comprises a shell, wherein the inner wall of the shell is provided with a primary chilling chamber formed by the shell, an upper support plate, the upper part of a lower support plate, and a partition plate; a secondary chilling chamber formed by the shell, the lower part of the lower support plate and the partition plate is arranged below the primary chilling chamber; the upper support plate is connected with a vaporizing chamber; and a high-temperature synthetic gas circulating channel is formed at the center in the shell. The invention also provides an application method of the high-temperature synthetic gas graded chilling device, which is implemented in a way that: part of chilling gas enters the primary chilling chamber through a primary chilling gas inlet, the rest of chilling gas enters the secondary chilling chamber through a secondary chilling gas inlet, and the two parts of chilling gas are respectively sprayed out by a primary sprayer and a secondary sprayer and mixed with high-temperature synthetic gas. The device provided by the invention can quickly, uniformly and efficiently lower the high-temperature synthetic gas to the temperature range required by the technique through graded chilling, has the characteristics of simple structure and low operating cost, and is convenient for maintenance.