Coulomb blockade in monolithic and monocrystalline Al-Ge-Al nanowire heterostructures

We report the realization of Ge single-hole transistors based on Al-Ge-Al nanowire (NW) heterostructures. The formation of these axial structures is enabled by a thermally induced exchange reaction at 350 °C between the initial Ge NW and Al contact pads, leading to a monolithic and monocrystalline Al-Ge-Al NW. The 25 nm-diameter Ge segment is a quasi-1D hole channel. Its length is defined by two abrupt Al-Ge Schottky tunnel barriers. At low temperatures, the device shows a single hole transistor signature with well pronounced Coulomb oscillations. The barrier strength between the Ge segment and the Al leads can be tuned as a function of the gate voltage VG. It leads to a zero conductance at VG= 0 V to a few quantum conductance at VG= –15 V. When the gate voltage increases from –5 V to –3 V, the charging energy is extracted and it varies from 0.39 meV to 2.42 meV.We report the realization of Ge single-hole transistors based on Al-Ge-Al nanowire (NW) heterostructures. The formation of these axial structures is enabled by a thermally induced exchange reaction at 350 °C between the initial Ge NW and Al contact pads, leading to a monolithic and monocrystalline Al-Ge-Al NW. The 25 nm-diameter Ge segment is a quasi-1D hole channel. Its length is defined by two abrupt Al-Ge Schottky tunnel barriers. At low temperatures, the device shows a single hole transistor signature with well pronounced Coulomb oscillations. The barrier strength between the Ge segment and the Al leads can be tuned as a function of the gate voltage VG. It leads to a zero conductance at VG= 0 V to a few quantum conductance at VG= –15 V. When the gate voltage increases from –5 V to –3 V, the charging energy is extracted and it varies from 0.39 meV to 2.42 meV.