Chemical Shift Determined According to Flow Rate Ratio O2/BTMSM by Fourier Transform Infrared Spectra and X-ray Photoelectron Spectroscopy

Organic-inorganic hybrid silica materials grown on an interlayer low dielectric material have been studied. Organic-inorganic hybrid silica materials have a low dielectric constant due to the presence C and H atoms which are lighter than Si and O. In this study, it was confirmed the chemical shift clarified by Fourier Transform Infrared spectroscopy and X-ray photoelectron spectroscopy (XPS) that the characteristics of the organosilicate films are attributable to the cross-link with low electronic polarizability and the cross-link breakdown structure with pores. The fourier transform infrared (FTIR) spectra from the peak at 3450 cm-1 to the peak at 3600 cm-1 are formed by the OH bond of R–OH...O–C type, and the band from the peak at 3580 cm-1 to the peak at 3670 cm-1 is formed by the C–H...O hydrogen bond of R–O=C type. Among organosilicate films as organic inorganic hybrid silica materials, those films with the electron-widthdrawing group consist of the bond structure of organometallic carbon, and those with the electron-releasing group consist of the bond structure of organic carbon, and this was confirmed by XPS.