Apparatus for treating substrates using supercritical fluid, substrate treatment system including the same and method of treating substrates using the same

In the substrate processing apparatus and method, and second processing the substrate using a supercritical fluid (process) a process chamber, the injection valve and the supercritical fluid injecting the supercritical fluid in the process chamber the inside pressure such that the first process pressure to generating a turbulent flow in the interior of the process chamber to supplement at a high speed, and a mixture of the separation of the reduced pressure inside the pressure from the process fluid supply module and a substrate provided with a turbulence generator to recover a first process pressure the chemical solution and the supercritical fluid supercritical an internal pressure to the mixture extracted in part includes the first pressure unit to a low pressure second chamber pressure than the first process pressure. Supercritical mixture partial repeatedly perform the discharging and supercritical partial replacement of the drug solution to increase the removal efficiency to phase out the supercritical mixture to suppress the formation of ice particles according to the adiabatic expansion.