VIISta Trident: New generation high current implant technology

Recent developments in device architecture and the continuing search for tighter process control have driven the requirement for no energy contamination, high accuracy dose control, more precise angle control and peak dose rate control. The new high current VIISta Trident ion implanter has demonstrated the capability to meet the demanding process control requirements for these next generation devices, and to deliver the productivity necessary for high volume manufacturing. In this paper, we present the innovative elements of the VIISta Trident beam line, the advanced ion beam control capabilities and the impact of these unique features on process performance.