The progress made using the combustion chemical vapor deposition (CCVD) technique to fabricate YBa/sub 2/Cu/sub 3/O/sub 7-x/ coated conductors
2003
Combustion Chemical Vapor Deposition (CCVD) is a nonvacuum technique being investigated, in conjunction with the Rolling Assisted Biaxially Textured Substrates (RABiTS/spl trade/) process, as a method to fabricate low-cost, long-length Yttrium Barium Copper Oxide (YBCO) coated conductor tapes. This technique has been scaled to produce meter + lengths of buffer material with excellent epitaxial and microstructural uniformity along the length. Additional efforts focus on depositing YBCO on these lengths using several deposition techniques including CCVD. Pulsed laser deposition (PLD) YBCO with critical current densities >1 MA/cm/sup 2/ have been achieved on short coupons taken from meter lengths of CeO/sub 2//STO/Ni architectures. CCVD buffer layers on Ni-W are still being optimized as YBCO critical current densities are less than 50,000 A/cm/sup 2/. The critical current densities of coupons of YBCO deposited by CCVD onto CCVD buffered substrates is increasing up to 100,000 A/cm/sup 2/, but further optimization is needed to yield high performance samples.
Keywords:
- Microstructure
- Nuclear magnetic resonance
- Chemical vapor deposition
- Epitaxy
- Combustion chemical vapor deposition
- Yttrium barium copper oxide
- Physics
- Analytical chemistry
- Copper oxide
- Pulsed laser deposition
- Electrical conductor
- Deposition (law)
- High-temperature superconductivity
- Condensed matter physics
- Optoelectronics
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
2
References
7
Citations
NaN
KQI