Field emission of diamond films grown on glass substrates at low temperatures

Using microwave plasma-enhanced chemical vapor deposition, diamond films were successfully grown on Ti-coated glass substrates at temperatures as low as around 500℃ in behalf of practical applications to field emitters. Electron emission was observed at turn-on fields below 18 V/㎛. Field emission characteristics of diamond films were discussed in terms of their crystalline qualities. Diamond films with poorer crystalline qualities showed better field emission properties.