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HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.
HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.
2000
Fcmjm van Delft
Jp Weterings
Ak Suurling
J. Romijn
Keywords:
Optoelectronics
Nanoscopic scale
Electron-beam lithography
Resist
Bilayer
Materials science
Aspect ratio (aeronautics)
Correction
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