Ablation plasma ion implantation: experiments and theory

Research is underway to accelerate laser ablation plume ions for implantation (APII) into substrate. Ablation plasma ion implantation biases the deposition substrate by a large negative voltage pulse. APII has the advantages of direct acceleration and implantation of ions from metals or any other solid targets. This process is environmentally benign because it avoids the use of toxic gaseous precursors. Initial experiments are directed towards the implantation of iron ions into silicon substrates at negative voltages up to -10 kV.