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Numerical calculation of dislocation behavior in Si substrate during thermal process
Numerical calculation of dislocation behavior in Si substrate during thermal process
2019
Ryohei Sato
Toshihiko Takakura
Kazuo Ito
Takuya Saraya
Toshiro Hiramoto
Koichi Kakimoto
Shin-ichi Nisizawa
Keywords:
Substrate (chemistry)
Dislocation
Thermal
Semiconductor
Composite material
Materials science
si substrate
Correction
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