Old Web
English
Sign In
Acemap
>
Paper
>
Electrical Characterization Techniques for Si Substrate Damage during Plasma Etching
Electrical Characterization Techniques for Si Substrate Damage during Plasma Etching
2011
Nakakubo Yoshinori
Eriguchi Koji
Matsuda Asahiko
Takao Yoshinori
Ono Kouichi
Keywords:
Substrate (chemistry)
Plasma etching
Analytical chemistry
Materials science
current voltage
capacitance voltage
si substrate
Optoelectronics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]