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Refractive Index and Bandgap Variation in Al 2 O 3 -ZnO Ultrathin Multilayers Prepared by Atomic Layer Deposition
Refractive Index and Bandgap Variation in Al 2 O 3 -ZnO Ultrathin Multilayers Prepared by Atomic Layer Deposition
2018
Javier Alonso Lopez Medina
Hugo Borbón Nuñez
Eder Lizarraga Medina
Eduardo Murillo Bracamontes
R. Machorro
Nicola Nedev
H. Márquez
Mario Farías Sánchez
G. Soto
H. Tiznado
Keywords:
Atomic layer deposition
Optoelectronics
Refractive index
Band gap
Materials science
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