Old Web
English
Sign In
Acemap
>
Paper
>
Application of Microwave Plasma Gate Oxidation to Strained-Si on SiGe and SGOI
Application of Microwave Plasma Gate Oxidation to Strained-Si on SiGe and SGOI
2005
Mika Nishisaka
Tanemasa Asano
Keywords:
Nanotechnology
Analytical chemistry
Ion source
Materials science
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]