Old Web
English
Sign In
Acemap
>
Paper
>
Addressing Key Concerns for Implementation of Ni FUSI into Manufacturing for 45/32 nm CMOS
Addressing Key Concerns for Implementation of Ni FUSI into Manufacturing for 45/32 nm CMOS
2007
a. Shickova
Thomas Kauerauf
Aude Rothschild
Marc Aoulaiche
S. Sahhaf
Ben Kaczer
A. Veloso
C Torregiani
Luigi Pantisano
Anne Lauwers
M. B. Zahid
Thomas Odell Rost
H. L. Tigelaar
M.F. Pas
John Fretwell
Jon G. McCormack
Thomas Hoffmann
C. Kemer
Thomas Chiarella
Sergio Bras
Yasunori Harada
Masaaki Niwa
Vidya Kaushik
H. E. Maes
Philippe Absil
Guido Groeseneken
Serge Biesemans
Jorge Kittl
Keywords:
Engineering physics
CMOS
Computer science
Correction
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]