A Three Pulse Electrochemical Regime as a Fabrication Platform for Nano-structured Multifunctional Silicon Based Materials and Their Primary Prototypes

Nano-Silicon is an extremely versatile material that can be structured at the level of its porosity, multi-film thicknesses or size of particles. Science's keen interest in these new nanomaterials is motivated by new fascinating properties and their tunability. Different forms of nano-Si primary prototypes can be made using a novel cyclic three-pulse electrochemical regime presented in this work. It consists of three pulses of different intensity: a working pulse when layer with determined thickness and porosity is formed; a cut pulse that introduces an embedded pre-partition between the layers; and an etch stop pulse when electrolyte is refreshed. An easy control by electrical means of overall morphology opens the possibility for large variations of nano-structuring in the obtained material. In-situ deposition of some metals simultaneously with layers formation through variation of the electrolyte composition and some parameters of the electrical regime is attainable as well.