Low-scatterer sub-strong scattering source positioning method and low-scatterer forming design method

The invention discloses a low-scatterer sub-strong scattering source positioning method based on scattering mechanism diagnosis. The low-scatterer sub-strong scattering source positioning method comprises the following steps of S01, respectively performing electromagnetic characteristic analysis on an objective scatterer according to a characteristic basis function and a high-frequency asymptotic method, acquiring RCS data of the objective scatterer under an attention attitude and a frequency; and S02, comparing the data results which are obtained through the two analysis methods, and finding a difference for determining the position of a sub-strong scattering source. The invention further discloses a low-scatterer forming design method based on the low-scatterer sub-strong scattering source positioning method. The low-scatterer sub-strong scattering source positioning method provided by the invention can position a majority of sub-strong scattering sources and determines the magnitude for being used as an important basis for optimizing forming of the low-scatterer. The low-scatterer sub-strong scattering source positioning method has advantages of preventing blind optimization attempts caused by subjective assume, greatly improving low-scatterer forming design efficiency and realizing relatively wide application range. The low-scatterer forming design method based on the positioning method has advantages of clear and definite process, and convenient application.