Fast formation of amorphous titanium dioxide thin films using a liquid-assisted plasma-enhanced deposition process in open air

Abstract In this work, the deposition of titanium oxide thin films at atmospheric pressure via an open-air liquid-assisted plasma-enhanced method has been studied. Morphology, chemical composition, crystal structure as well as optical properties of the deposited thin films were investigated. The method successfully enabled the formation of compact and transparent amorphous TiO 2 layers with a high deposition rate of 1.2 μm per minute. The atmospheric pressure method reported here appears to be a promising up-scalable method for the high rate and large scale deposition of amorphous titanium dioxide thin films.