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Impacts of gate electrode formation process on interface properties of Al 2 O 3 /GaN gate stack structure
Impacts of gate electrode formation process on interface properties of Al 2 O 3 /GaN gate stack structure
2020
Yuto Ando
Tohru Nakamura
Manato Deki
Noriyuki Taoka
Hirotaka Watanabe
Atsushi Tanaka
Shugo Nitta
Yoshio Honda
Hisashi Yamada
Mitsuaki Shimizu
Hiroshi Amano
Keywords:
Materials science
Optoelectronics
gate stack
Electrode
Correction
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