Advanced Thin Wafer Support Processes for Temporary Wafer Bonding

The ZoneBOND™ process has been developed to allow temporary wafer bonding at acceptable temperatures (usually less than 200°C), survival through higher-temperature processes, and then demounting at room temperature. The technology utilizes standard silicon or glass carriers and current thermoplastic adhesives developed by Brewer Science, Inc. The separation process consists of three components: removal of the adhesive in the outer zone, lamination of the device side of the pair, and separation of the carrier wafer from the adhesive. Developments of these key areas are the focus of this paper.