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Novel Ion Implantation Process with High Heat Resistant Photoresist in Silicon Carbide Device Fabrication
Novel Ion Implantation Process with High Heat Resistant Photoresist in Silicon Carbide Device Fabrication
2014
Takanori Fujiwara
Yugo Tanigaki
Yukihiro Furukawa
Kazuhiro Tonari
Akihiro Otsuki
Tomohiro Imai
Naoyuki Oose
Makoto Utsumi
Mina Ryo
Masahide Gotoh
Shinichi Nakamata
Takao Sakai
Yoshiyuki Sakai
Masaaki Miyajima
Hiroshi Kumura
Kenji Fukuda
Hajime Okumura
Keywords:
Ion implantation
Photoresist
Silicon carbide
Metallurgy
Materials science
high heat
Fabrication
Correction
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