Interface scattering as a source for diffuse interference in cuprous oxide on copper

Abstract Interference in the diffuse reflectance (IDR) from thermally oxidized copper is considered. It is demonstrated that the diffuse reflectance scales with the value of the time-averaged square of electric field, 〈 E 2 〉 at the oxide/metal interface. The appearance of IDR is therefore a sensitive probe of interface roughness created by the oxidation.