Micro-processing using plasma source ion implantation

Plasma source ion implantation is a viable technique to modify surface properties to achieve desired mechanical, electrical, and optical properties on microscopic surface profiles. Implanting ions into materials has been shown by many to increase surface hardness, reduce friction, and resist corrosion. Preliminary work performed on test electrodes has shown an increase in the suppression of field emission by an order of magnitude from 3 MV/m to 30 MV/m. Processed soda-lime glass slides have demonstrated a dramatic change in optical properties as the index of refraction decreased significantly with light at wavelengths greater than 600 nm. These advantages illustrate the unique capabilities of PSII for micro-processing.