Investigation of the properties of amorphous carbon films obtained in a supersonic gas jet

Abstract Amorphous carbon films on silicon, obtained in the supersonic gas jet containing dimers (C 2 ), are investigated. The plasma jet is generated by the disk magnetohydrodynamic plasma accelerator in which methane is used as the plasma-forming gas. The resulting layers consist of two phases; their relation depends on the distance from the jet nozzle to the substrate. It was shown that the resulting hydrogenated carbon phase is easily removed during etching in the oxygen plasma. Scanning electron microscopic and ellipsometric measurements were carried out. The data on the adsorption activity of the layers with respect to alcohols, aromatic hydrocarbons and heptane were obtained.