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Titanium disilicide films for the metallization of the connections of VLSI circuits
Titanium disilicide films for the metallization of the connections of VLSI circuits
1987
S.L. Antonov
A. G. Vasil’ev
A. A. Orlikovskii
A.E. Sedel'nikov
Keywords:
Titanium disilicide
Titanium
Secondary ion mass spectrometry
Very-large-scale integration
Analytical chemistry
Integrated circuit
Mass spectrometry
Electron diffraction
Materials science
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