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Research on R-Plane Sapphire Substrate CMP Removal Rate Based on a New-Type Alkaline Slurry
Research on R-Plane Sapphire Substrate CMP Removal Rate Based on a New-Type Alkaline Slurry
2018
Xin Zhao
Xinhuan Niu
Da Yin
Jianchao Wang
Kai Zhang
Keywords:
Substrate (chemistry)
Sapphire
Inorganic chemistry
Chemistry
Slurry
sapphire substrate
Correction
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