The eeffect of Y ion implantation on the oxide growth kinetics in Fe-24Cr

We have investigated the effect of Y ion implantation on the high temperature oxidation of Fe-24Cr using Rutherford backscattering spectroscopy and analytical electron microscopy. Results indicate that implantation of Y has a very large effect on the growth rate of the oxide compared to metals alloyed with Y. Analytical tools have been applied to determine the spatial distribution of Y and the microstructure of the oxide. Results are compared with those of recent cation grain boundary diffusion measurements in Cr/sub 2/O/sub 3/ and Cr/sub 2/O/sub 3/ doped with Y/sub 2/O/sub 3/.