ITO film plating rework treatment etching solution and preparation method thereof

Belonging to the field of TFT-LCD thinning film plating, the invention discloses an ITO (indium tin oxide) film plating rework treatment etching solution and a preparation method thereof. The ITO film plating rework treatment etching solution is formed by mixing the five raw materials hydrochloric acid, oxalic acid, organic polybasic phosphoric acid, iodic acid and pure water evenly. The preparation process of the ITO film plating rework treatment etching solution consists of: adding strong acid cation exchange resin into hydrochloric acid, conducting mixing, then filtering out the strong acid cation exchange resin, and controlling or removing impurity ions in hydrochloric acid; and successively adding oxalic acid crystals, part of pure water, hydrochloric acid, organic polybasic phosphoric acid, iodic acid and residual pure water, and finally performing filtering to obtain the ITO film plating rework treatment etching solution. The etching solution provided by the invention has good wettability to an ITO layer, and guarantees complete etching of ITO on TFT-LCD, thus reducing scrap rate of the product. After etching, the microcrystal residue is few, thereby ensuring that the etching solution does not block a filter during use.