Low-temperature synthesis of large-area graphene-based transparent conductive films using surface wave plasma chemical vapor deposition

We present a low-temperature (300–400 °C), large-area (23 cm×20 cm) and efficient synthesis method for graphene-based transparent conductive films using surface wave plasma chemical vapor deposition. The films consist of few-layer graphene sheets. Their transparency and conductivity characteristics make them suitable for practical electrical and optoelectronic applications, which have been demonstrated by the proper operation of a touch panel fabricated using the films. The results confirm that our method could be suitable for the industrial mass production of macroscopic-scale graphene-based films.