[Self-cleaning and antimicrobial properties of methacrylic acid coupled TiO(2)/PMMA denture base resin].

PURPOSE: To study the influence of TiO2 and methacrylic acid on self-cleaning and antimicrobial properties of denture base resin.METHODS: TiO2(2%,4%,6%) and methacrylic acid were respectively added into two makers' denture base resins.The self-cleaning property was assayed with measuring the decomposition of methylthioninium chloride.The antimicrobial property was tested with the pellicle-sticking method.The data were analysed by SPSS 12.0 software package for two-way ANOVA.RESULTS: The self-cleaning and antimicrobial properties of samples were improved as TiO2 increased.Methacrylic acid had no significant influence on self-cleaning and antimicrobial properties of the samples.The decomposition ratio and antimicrobial ratio of MTi4%(Rijin) were 53.96% and 71.42%,respectively.CONCLUSION: Methacrylic acid coupled TiO2/PMMA denture base resin enjoys good self-cleaning and antimicrobial properties.