Scanner qualification with IntenCD based reticle error correction
2010
Scanner introduction into the fab production environment is a challenging task. An efficient evaluation of scanner
performance matrices during factory acceptance test (FAT) and later on during site acceptance test (SAT) is crucial for
minimizing the cycle time for pre and post production-start activities. If done effectively, the matrices of base line
performance established during the SAT are used as a reference for scanner performance and fleet matching monitoring
and maintenance in the fab environment.
Key elements which can influence the cycle time of the SAT, FAT and maintenance cycles are the imaging, process and
mask characterizations involved with those cycles.
Discrete mask measurement techniques are currently in use to create across-mask CDU maps. By subtracting these maps
from their final wafer measurement CDU map counterparts, it is possible to assess the real scanner induced printed errors
within certain limitations. The current discrete measurement methods are time consuming and some techniques also
overlook mask based effects other than line width variations, such as transmission and phase variations, all of which
influence the final printed CD variability.
Applied Materials Aera2 TM mask inspection tool with IntenCD TM technology can scan the mask at high speed, offer full mask coverage and accurate assessment of all masks induced source of errors simultaneously, making it beneficial for
scanner qualifications and performance monitoring.
In this paper we report on a study that was done to improve a scanner introduction and qualification process using the
IntenCD application to map the mask induced CD non uniformity. We will present the results of six scanners in production and discuss the benefits of the new method.
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