Sputtered nickel coverage of the SiO 2 nano-step

In this paper we give a survey of the problems that we encountered during deposition and examination of the Ni layers on SiO 2 nano-step. We made nano-layer of SiO 2 and deposited Ni film on top of it thus making particular structure in nano dimensions by utilizing microelectronics equipment. This research and solutions that we made help in understanding feasibility of transition from microelectronics to nanotechnology. Employment of Ni layers is motivated by the increased importance of the nickel silicide films in ULSI.