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In-Situ measurements of plane spacing during electromigration in a passivated AI line
In-Situ measurements of plane spacing during electromigration in a passivated AI line
1996
P. C. Wang
Ismail C. Noyan
E.G. Liniger
C.-K. Hu
G. S. Cargill
Keywords:
Materials science
In situ
Electromigration
Optoelectronics
Correction
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