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PRODUCTION OF SILICON OXYNITRIDE LAYERS BY USE OF HEXAMETHYLDISILAZANE ANDNITROGEN (I) OXIDE
PRODUCTION OF SILICON OXYNITRIDE LAYERS BY USE OF HEXAMETHYLDISILAZANE ANDNITROGEN (I) OXIDE
1992
L. V. Khramova
T. P. Smirnova
E.G. Eremina
Keywords:
Oxide
Inorganic chemistry
Silicon oxynitride
Chemistry
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