Interfacial Diffusion Behavior of Thermal Bimetal 5J20110 with High Sensitivity

The thermal bimetal 5J20110 with high sensitivity was prepared by cold rolling bonding process, the effect of diffusion annealing temperature and time on the properties and interfacial diffusion behavior of 5J20110 was studied. Combining with the principle of diffusion, the diffusion law of interfacial alloy elements was calculated and analyzed, and the relation that the interfacial diffusion layer thickness varying with diffusion annealing temperature and time was deduced. The results showed that the diffusion trend of alloy elements enhanced gradually and the thickness of diffusion layer increased gradually with the increase of diffusion annealing temperature and time, and the bonding strength and resistivity of the thermal bimetal varied little. It is found that the interfacial diffusion layer is solid solution, and the diffusion layer thickness is proportional to the square root of diffusion time t1/2 and e−1/T of diffusion temperature T. The formula for the growth of the interfacial diffusion layer thickness derived in this paper can provide the basis for optimizing the diffusion annealing process.