The New Material Structure Design and Research of the GaAs-Based Resonant Tunneling Diodes

2011 
Use MBE technology grew three different structures’ RTD to get a contrast test on device with different thickness of well structure’s DC character,they all grew on semi-insulating GaAs substrates, and use I-V analysis instrument tested the I-V character of the RTD in room temperature, in the test results , the PVCR of the best device was up to 7.1,VP is reduced to 0.4V ,then we analyzed the relationship between the device material structure and I-V character , this paper provided a reference for the better performance of the RTD structure design.
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    7
    References
    0
    Citations
    NaN
    KQI
    []