Successful implementation of a MEMS micromirror array in a lithograpy illumination system

In this paper, the implementation of a controllable MEMS-micromirror into the illumination system of an ASML lithography scanner is described. Being the industry's technology leader, ASML is keen on implementing new technology to improve lithography performance. The introduction of a controllable MEMS micromirror array in the illumination system opens many opportunities for improvements. To make a MEMS-micromirror array meet the imaging specifications, ASML's expertise on system design and high performance control design was used to come to a timely and affordable solution. This paper will show an overview of the system and control design and show the results that our customers achieve.