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Plasma parameters & rf power coupling mechanism to the low pressure rf inductive discharge
Plasma parameters & rf power coupling mechanism to the low pressure rf inductive discharge
2013
A. F. Alexandrov
E. A. Kralkina
P.A. Nekludova
V. B. Pavlov
A. K. Petrov
A.A. Rukhadze
K. V. Vavilin
Keywords:
RF power amplifier
Plasma parameters
Electronic engineering
Coupling
Materials science
Optoelectronics
Correction
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