A new method for manufacturing nanostructured electrodes on glass substrates

The present paper describes a new method for manufg. a nanostructured porous layer of TiO2 on a conducting glass substrate for use in a dye-sensitized photoelectrochem. cell. The method involves deposition of a layer of semiconductor particles onto a conducting substrate and compression of the particle layer to form a mech. stable, elec. conducting, and porous nanostructured film at room temp. Photoelectrochem. characteristics and morphol. of the resulting nanostructured films are presented. The potential use of the new manufg. method in the future applications of nanostructured systems is discussed.