Reduction of photoexcited carriers modulation due to a long distance photoelectron pass in photorefractive Bi12SiO20

We report the study of cross talk between two competing modulated gratings in photorefractive Bi12SiO20. Zero cross-talk technique applies to exactly measure the reduction factor in diffusion regime. We suggest that the reduction factor is associated with a long-distance photoelectron path (100 µm) in the crystal.