Reply to Comment on 'Contributions of vacancies and self-interstitials to self-diffusion in silicon under thermal equilibrium and nonequilibrium conditions

R. Kube,1 H. Bracht,1 E. Huger,2 H. Schmidt,2 J. Lundsgaard Hansen,3 A. Nylandsted Larsen,3 J. W. Ager III,4 E. E. Haller,4 T. Geue,5 J. Stahn,5 M. Uematsu,6 and K. M. Itoh6 1Institute of Materials Physics, University of Munster, Wilhelm-Klemm-Strasse 10, D-48149 Munster, Germany 2Institut fur Metallurgie, AG Mikrokinetik, Technische Universitat Clausthal, D-38678 Clausthal-Zellerfeld, Germany 3Department of Physics and Astronomy, University of Aarhus, DK-8000 Aarhus, Denmark 4Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720, USA 5Laboratory for Neutron Scattering, Paul Scherrer Institut, Villigen PSI CH-5232, Switzerland 6School of Fundamental Science and Technology, Keio University, Yokohama 223-8522, Japan (Received 28 July 2014; published 24 September 2014)