Dip Pen Nanolithography: a maturing technology for high-throughput flexible nanopatterning
2007
Precision nanoscale deposition is a fundamental requirement for much of current nanoscience research. Further,
depositing a wide range of materials as nanoscale features onto diverse surfaces is a challenging requirement for
nanoscale processing systems. As a high resolution scanning probe-based direct-write technology, Dip Pen
Nanolithography® (DPN®) satisfies and exceeds these fundamental requirements. Herein we specifically describe the
massive scalability of DPN with two dimensional probe arrays (the 2D nano PrintArray). In collaboration with
researchers at Northwestern University, we have demonstrated massively parallel nanoscale deposition with this 2D
array of 55,000 pens on a centimeter square probe chip. (To date, this is the highest cantilever density ever reported.)
This enables direct-writing flexible patterns with a variety of molecules, simultaneously generating 55,000 duplicates at
the resolution of single-pen DPN. To date, there is no other way to accomplish this kind of patterning at this
unprecedented resolution. These advances in high-throughput, flexible nanopatterning point to several compelling
applications. The 2D nano PrintArray can cover a square centimeter with nanoscale features and pattern 10 7 mm 2 per
hour. These features can be solid state nanostructures, metals, or using established templating techniques, these advances
enable screening for biological interactions at the level of a few molecules, or even single molecules; this in turn can
enable engineering the cell-substrate interface at sub-cellular resolution.
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