Deposition of heteroepitaxial layers of topological insulator Bi2Se3 in the trimethylbismuth–isopropylselenide–hydrogen system on the (0001) Al2O3 and (100) GaAs substrates

Thin solid layers that are formed upon heating of the gaseous trimethylbismuth–isopropylselenide–hydrogen system on the (0001) Al2O3 and singular and vicinal (100) GaAs surfaces are studied. The conditions for deposition of metal Bi and phases of Bi4Se3, BiSe, and topological insulator Bi2Se3 using the MOCVD method are determined. Pure metastable phase BiSe is obtained for the first time. Bi2Se3 films with a thickness of no less than 200 nm, a relatively low volume concentration of 3 ×1018 cm–3, and a high mobility of carriers at 300 K (1000 cm2 V–1 s–1) are fabricated.