Preparation, Surface Morphology and Electrical Properties of Multilayer Antireflection Thin Films

Abstract In this study we have prepared different designs of thin films by physical vapour deposition with the help of MgF 2 and YF 3 materials of high and low refractive index on BK-7 glass substrate at 684 nm wavelength. To study the electrical properties, Silver electrodes have been coated between the top and bottom of different multilayer structures with the help of aluminum masking on the BK-7 glass substrate. The electrical and surface properties of multilayer thin films produced by PVD technique have been investigated. The surface morphology of Roughness (Ra) and grain size were systematically investigated by Atomic Force Microscope (AFM). The electrical conductivity at room temperature was obtained by using Four probe method. Electrical resistance is found to vary with the thickness of the layer thickness. In order to understand the composition and microstructures of the thin films were investigated systematically by SEM where the films have been grown on BK-7 glass substrate using PVD technique with the substrate temperature of 300K during the deposition process.