Double patterning in nanoimprint lithography

Display Omitted We demonstrated two double patterning (DP) processes in nanoimprint lithography.As this work was a proof-of-concept, we used commercially available resins.Despite difficulties arising with respect to pattern deformation, the second pattern was successfully imprinted on the first.This means that the range of potential NIL products can be increased. Nanoimprint lithography (NIL) is a simple fabrication process used to produce nanostructured devices with high resolution, high throughput and at low cost. The resolution of the mold pattern determines the resolution of the imprint pattern obtained. Thus, to improve the resolution of the nanostructures attainable by NIL, new methods are required to produce higher-resolution molds. In photolithography, double patterning significantly enhances the resolution of the nanoscale features. We demonstrate the use of double patterning nanoimprinting using ultraviolet and room-temperature-NIL resin systems. This paves the way toward a much greater variety of higher-resolution NIL products.