Spatial distribution of cavities in silicon formed by ion implantation generated excess vacancies

2004 
The spatial distribution of nanosized cavities in silicon formed by high energy Ge ion implantation and annealing is determined. The cavities are directly observed by transmission electron microsco ...
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    17
    References
    12
    Citations
    NaN
    KQI
    []