The Study of the Boron Nitride Thin Layer Structure

The structure of thin layers of boron nitride obtained by low temperature plasma enhanced chemical vapour deposition of borazine as precursor has been investigated by X-ray diffraction method. The diffraction pattern consists of the superposition of the three patterns: from non-crystalline turbostrate am-BN, from polycrystalline h-BN and c-BN. The sizes of intermolecular (nucleus surrounded by fringe), 14.8 A, and intramolecular (nucleus), 7.6 A, formations are evaluated from the reflection positions in non-crystalline state and confirmed by calculation. Polycrystalline reflections from h-BN and c-BN are in accordance with known ones for these modifications.