New method to determine process window considering pattern failure
2010
In this paper, new metric, acid concentration distribution image log slope (AILS) is suggested to predict pattern failure in
photo lithography. By introducing AILS, pattern fidelity can be determined as numbers. With evaluating at the top 10%
and bottom 10% of photo resist, various kinds of pattern failures are categorized and they can be predicted to be failed or
not. The simulation results are compared with wafer experiment results and shows great prediction accuracy. In order to
evaluate hot spot regarding pattern failure in all possible pitch and duty ratio, in-house image quality analysis tool is used
and compared with wafer experimental results. Minimum normalized AILS (NAILS) to cause pattern bridge is larger
than that to cause lift off. Both pattern failures are dependent of AILS and CD but the effect of CD on pattern failure is
stronger than AILS's
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